关键词: 小麦, 旗叶性状, 遗传模型, 产量, 相关分析

Abstract:

【Objective】 Flag leaf is an important place for wheat photosynthetic carbon fixation, which plays an important role in wheat yield. The genetic characteristics and the genetic mechanism were analyzed under high and low nitrogen for flag leaf traits of wheat, which will provide a reference for excellent plant-type breeding and high-yield breeding. 【Method】 188 recombinant inbred line (RIL) populations derived from a cross between Kenong9204 and Jing411 was used in this study, which were planted in low nitrogen (LN) and high nitrogen (HN), respectively. The flag leaf traits of 188 RILs were investigated in 6 different environments, then the genetic analysis was conducted to determine the number of genes controlling each trait, and to estimate the genetic effect value and the heritability. In addition, the relationship between flag leaf characters and yield related traits of wheat was also studied.【Result】 Under LN environment: The optimal genetic model of flag leaf length was 2MG-CE (two pairs of interaction major genes) in E3. The additive × additive epistatic interaction value was 1.098, and the heritability of major genes was 31.35%. The flag leaf length was polygenic in another LN environment. The width of flag leaf was polygenic in all the LN environment. The optimal genetic model for flag leaf area (except E5) was 2MG-CE. The additive × additive epistatic interaction value was 1.884 and the heritability of major genes was 36.7%, while it was polygenic inheritance in E5. Under HN environment: The optimal genetic model for flag leaf length (except E4) was 2MG-CE, the additive × additive epistatic interaction value was 1.133, and the heritability of major genes was 32.6%. The optimal genetic model was 2MG-ER (two pairs of recessive epistatic major genes) in E4, which the additive effect value was 1.431 and 1.108 for the first and the second major genes respectively, and the heritability of the major gene was 51.77%. The optimal genetic model for flag leaf width (except E2) was 2MG-CE, the additive × additive epistatic interaction value was 0.119, and the heritability of major genes was 37.29%, while it showed polygenic inheritance in E2. The optimal genetic model for flag leaf area was 2MG-CE, which the additive × additive epistatic interaction value was 3.067 and the heritability of the main gene was 44.42%. The genetic models of flag leaf traits were different in different environments, which the genetic model was more stable under HN than that in LN. The correlation analysis of flag leaf and yield traits showed that flag leaf traits were significantly positively correlated with grain number per spike, grain weight per spike and yield per plant, and the influence degree was different in the 6 environments. 【Conclusion】 Flag leaf traits are easily affected by environment, and the performance of flag leaf traits is different in HN and LN. Flag leaf traits exhibited different major gene inheritance and polygene inheritance in LN, while they showed major gene inheritance which controlled by two pairs of interactions genes in most of HN environment, which might be major QTLs. Yield per plant and grain weight per spike could be increased by improving flag leaf traits.

Key words: wheat, flag leaf traits, genetic model, production, correlation analysis